Introduction
The main customers of 25% TMAH are the well-known TFT-LCD factories in Taiwan, and it is also the raw material of 2.38% developer used by semiconductor factories in Taiwan.
Tetramethyl Ammonium Hydroxide (TMAH) – Electronic Grade Developer: Overview and Key Properties
| Category |
Details |
| Chemical Name |
Tetramethyl Ammonium Hydroxide (TMAH) |
| Molecular Formula |
C₄H₁₃NO |
| CAS Number |
75-59-2 |
| Appearance |
Colorless to pale yellow liquid |
| Grade |
Electronic Grade (High Purity ≥99.99%) |
Physical & Chemical Properties
| Property |
Value |
| Concentration |
2.38–25% (Semiconductor Grade) |
| Density (25°C) |
~1.01 g/cm³ (2.38% solution) |
| pH (25% sol.) |
~13.5 (Strong base) |
| Boiling Point |
Decomposes before boiling |
| Flash Point |
Non-flammable |
Key Applications in Electronics
| Application |
Function |
| Semiconductor Lithography |
Positive photoresist developer (for I-line, KrF, ArF) |
| LCD Manufacturing |
Etchant for indium tin oxide (ITO) |
| Wafer Cleaning |
Removes organic residues |
| Electroplating |
Additive for copper deposition |
Semiconductor-Grade Specifications
| Parameter |
Typical Requirement |
| Purity |
≥99.99% (Metals <1 ppb) |
| Particle Count |
<100 particles/mL (>0.2 µm) |
| Chloride (Cl⁻) |
<10 ppb |
| Sodium (Na⁺) |
<1 ppb |
Safety & Handling
| Parameter |
Details |
| OSHA PEL |
Not established (handle as corrosive) |
| Health Hazards |
Severe skin/eye burns; neurotoxic at high exposure |
| Storage |
Polyethylene bottles; avoid CO₂ absorption |
| First Aid |
Immediate water flushing (15 min for skin/eyes) |
Comparison with Alternative Developers
| Developer |
TMAH vs. Alternatives |
| KOH |
Higher metal contamination, less controllable |
| Tetraethyl Ammonium Hydroxide |
More expensive, slower development |
| Sodium Hydroxide |
Unsuitable for semiconductors (ionic contamination) |
Process Conditions (Photoresist Development)
| Parameter |
Typical Range |
| Concentration |
2.38–5% |
| Temperature |
20–23°C |
| Development Time |
30–90 sec (spin process) |
| Rinse |
DI water |
Market & Supply Chain
| Aspect |
Details |
| Global Demand |
~50.000 tons/year (25% sol. basis) |
| Price (25% sol.) |
$15–30/kg (Electronic Grade) |
| Major Suppliers |
Tama Chemicals, Sachem, Fujifilm, TOK |
Key Advantages and Limitations
| Advantages |
Limitations |
| Ultra-high purity for nodes <10nm |
Highly toxic (requires strict handling) |
| Excellent photoresist selectivity |
Decomposes at ~130°C |
| Low metal contamination |
Expensive purification process |
Summary
TMAH is the industry-standard developer for advanced semiconductor and LCD manufacturing due to its ultra-high purity, controllable development rate, and compatibility with modern photoresists. Despite its toxicity, no equally effective alternative exists for sub-10nm processes. Future trends focus on closed-loop recycling and lower-concentration formulations to reduce costs and hazards.
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