Defoamer
We are a manufacturer based in China, specializing in high-quality Defoamer for industrial clients worldwide. Technical support and custom formulation available.
Category：Textile Additives | Brand：MT
Introduction
Pretreatment Agent – Defoamer
| Defoamer | |
| High-efficiency non-silicon defoamer
Croscolor NJA |
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| Ionicity: non-ionic Dosage: 0.5-1.0g/L Target: all fabrics | High-efficiency non-silicon defoamer, can be used in various wet processing processes of textiles; stable in general dyeing baths and bleaching baths;
High shear resistance and high temperature resistance are good, and can be used in jet dyeing machines and high temperature and high pressure dyeing machines. |
| Osmotic defoamer
Croscolor CDA |
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| Ionicity: anionic/non-ionic Dosage: 0.2-0.5g/L Target: all fibers | It has excellent defoaming effect and is suitable for various printing and dyeing wet processing processes;
Excellent permeability and defoaming effect, especially suitable for the processing of compact fabrics and yarns; Resistant to low concentrations of acids, alkalis and electrolytes, and hard water. |
| Non-silicon penetrating defoamer
Croscolor MDSA |
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| Ionicity: non-ionic
Dosage: 0.5-1.0g/L Target: all fibers |
It has excellent defoaming effect and is suitable for various wet processing of printing and dyeing;
It has excellent permeability, the best permeability in the pH range of 4-13. and has a defoaming effect, especially suitable for the processing of compact fabrics and yarns; It is resistant to acids, alkalis and electrolytes of normal concentrations, and hard water; It does not contain silicon, does not contain APEO, and is environmentally friendly. |
| Defoamer
Croscolor CBAF |
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| Ionicity: non-ionic
Dosage: 0.2-0.5g/L Target: all fabrics |
Organic silicon defoamer can be used at room temperature or high temperature, suitable for defoaming when dyeing with various dyes, with balanced stability and defoaming, especially suitable for high temperature and high pressure dyeing – jet, warp dyeing and piece dyeing, etc. |
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